DocumentCode
2251747
Title
Compact high power laser-plasma X-ray source for lithography
Author
Gaeta, C.J. ; Rieger, H. ; Turcu, I.C.E. ; Forber, R.A. ; Campeau, S.M. ; Cassidy, K.L. ; Powers, M.F. ; Grygier, R.K. ; Maldonado, J.R. ; French, G. ; Naunguyan, J. ; Kelsy, C. ; Hark, P. ; Morris, J.H. ; Foster, R.M.
Author_Institution
JMAR Res. Inc., San Diego, CA, USA
fYear
2001
fDate
Oct. 31 2001-Nov. 2 2001
Firstpage
292
Abstract
Summary form only given. A compact laser produced plasma X-ray source generates 24 Watts average power of 1.1 nm X-rays in 2/spl pi/ steradians. The laser-plasma source is driven by a compact, diode-pumped, solid-state 300 Watt Nd:YAG laser system.
Keywords
X-ray lithography; X-ray production; laser beam applications; 1.1 nm; 24 W; 300 W; PIN diode measurements; X-ray lithography; YAG:Nd; YAl5O12:Nd; average power; diode-pumped Nd:YAG laser system; incident total laser power; laser-plasma X-ray source; lithographic wavelength; Laser beams; Lithography; Optical amplifiers; Optical pulse generation; Optical pulses; Plasma x-ray sources; Power lasers; Pulse amplifiers; Solid lasers; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2001 International
Conference_Location
Shimane, Japan
Print_ISBN
4-89114-017-8
Type
conf
DOI
10.1109/IMNC.2001.984204
Filename
984204
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