Investigation of EM scattering by obstacles on substrate surface using discrete sources method

The problems of EM scattering by an obstacle on the boundary of a layered half-space at the resonance frequency are very important due to various useful applications. In the semiconductor industry there exists a problem of detecting the contaminating particles on a silicon wafer surface. For the revelation of those particles a laser beam is used as an exciting field. So, the model of EM scattering for simulations seems to be more attractive. We consider the numerical technique produced by applying the discrete sources method to the boundary value problem (BVP). The essence of the DSM consists of constructing the scattered field as a superposition of the EM fields of dipoles and multipoles.