• DocumentCode
    2252367
  • Title

    High aspect ratio nano fluidic channels by laser controlled fracturing

  • Author

    Hui, A.P. ; Shui-jie Qin ; Li, W.J. ; Wang, M.Y.

  • Author_Institution
    Appl. Sci. & Technol. Res. Inst., Hong Kong, China
  • fYear
    2002
  • fDate
    24-24 Jan. 2002
  • Firstpage
    156
  • Lastpage
    159
  • Abstract
    This paper reports a novel laser processing technique for making channels in the nano regime. A Nd:YAG laser was used to dry fabricate micro channels (25 /spl mu/m-100 /spl mu/m diameter) in a 1 cm/sup 3/ fused silica substrate by thermal-induced processing. By controlling the locations of these initiating micro channels on a silica cube, 1D-controllable self-connecting nano fractures can be formed as rectangular channels. These nano channels are smooth and with extremely high aspect ratio (/spl sim/10/sup 4/ depth to width ratio). The length of the channels is controlled by the separation of the initiating micro channels. This laser-based nano channel fabrication technique is fast and inexpensive, and with potential applications in capillary electrophoresis and electro-osmosis driven nano-filtration.
  • Keywords
    fracture; laser materials processing; microfluidics; nanotechnology; 1D-controllable self-connecting nano-fracture; 25 to 100 micron; Nd:YAG laser processing; SiO/sub 2/; capillary electrophoresis; dry fabrication; electro-osmotic nano-filtration; fused silica substrate; high aspect ratio structure; laser controlled fracturing; nanofluidic channel; silica cube; thermal processing; Electrokinetics; Etching; Laser theory; Optical control; Optical device fabrication; Optical materials; Optical sensors; Optical surface waves; Silicon compounds; Surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7185-2
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2002.984228
  • Filename
    984228