DocumentCode
2252594
Title
Three-dimensional structure formed by holographic two-photon microfabrication of photoresist
Author
Takahashi, Hidetomo ; Hayasaki, Yoshio
Author_Institution
Dept. of Opt. Sci. & Technol., Univ. of Tokushima, Tokushima
fYear
2007
fDate
26-31 Aug. 2007
Firstpage
1
Lastpage
2
Abstract
Holographic two-photon microfabrication method performs high-speed parallel processing inside photosensitive materials using a computer-generated hologram displayed on a liquid crystal spatial light modulator. We demonstrate three-dimensional microfabrication using photoresist.
Keywords
computer-generated holography; electro-optical devices; liquid crystal devices; micro-optics; optical fabrication; optical materials; photoresists; spatial light modulators; two-photon processes; computer-generated hologram; high-speed parallel processing; holographic two-photon microfabrication; liquid crystal spatial light modulator; photoresist; photosensitive materials; three-dimensional structure; High speed optical techniques; Holographic optical components; Holography; Liquid crystal displays; Optical modulation; Optical pulses; Pulse amplifiers; Resists; Scanning electron microscopy; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics - Pacific Rim, 2007. CLEO/Pacific Rim 2007. Conference on
Conference_Location
Seoul
Print_ISBN
978-1-4244-1173-3
Electronic_ISBN
978-1-4244-1174-0
Type
conf
DOI
10.1109/CLEOPR.2007.4391757
Filename
4391757
Link To Document