DocumentCode
2252637
Title
3D nanoscale pattern formation in porous silicon
Author
Chun, Ik Su ; Chow, Edmond K. ; Li, Xiuling
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL
fYear
2008
fDate
4-9 May 2008
Firstpage
1
Lastpage
2
Abstract
A simple and effective processing technique for 3D nanoscale pattern formation in light emitting porous silicon is reported. The technique is based on metal assisted chemical etching and defined by the 2D nanoscale metal pattern.
Keywords
elemental semiconductors; etching; nanopatterning; optical fabrication; optical materials; porous semiconductors; silicon; 3D nanoscale pattern formation; Si; light emitting porous silicon; metal assisted chemical etching; Atomic force microscopy; Chemicals; Etching; Optical sensors; Pattern formation; Scanning electron microscopy; Silicon; Stimulated emission; Surface morphology; Surface topography; 160.4236 Nanomaterials; 160.6000 Semiconductor materials;
fLanguage
English
Publisher
iet
Conference_Titel
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-55752-859-9
Type
conf
Filename
4572152
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