Aberration corrected ultra-compact ultra-large angle curved grating multiplexer and demultiplexer on SOI platform

Author

Huang, Y. ; Ma, J. ; Chang, S. ; Zhao, Q. ; Ho, S.T.

Author_Institution

OptoNet Inc., Evanston, IL

fYear

2008

fDate

4-9 May 2008

Firstpage

1

Lastpage

2

Abstract

We describe a novel aberration free etched diffraction grating on SOI platform for on chip wavelength multiplexing and demultiplexing. Initial fabrication with 1 micron slit gives 200 GHz channel pass band with < 0.2 mm² chip size.

Keywords

demultiplexing equipment; diffraction gratings; etching; multiplexing equipment; optical communication equipment; optical fabrication; silicon-on-insulator; wavelength division multiplexing; MUX/DEMUX; SOI platform; aberration corrected ultra-large angle curved grating multiplexer; aberration free etched diffraction grating; channel pass band; fabrication technique; frequency 200 GHz; on chip wavelength demultiplexing; on chip wavelength multiplexing; silicon on insulator; Arrayed waveguide gratings; Diffraction gratings; Etching; Focusing; Multiplexing; Optical diffraction; Optical propagation; Optical waveguides; Propagation losses; Silicon on insulator technology; 050.1950 Diffraction gratings; 130.7408 Wavelength filtering devices;

fLanguage

English

Publisher

iet

Conference_Titel

Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on

Conference_Location

San Jose, CA

Print_ISBN

978-1-55752-859-9

Type

conf

Filename

4572158