Title :
Real-time process monitoring [semiconductor manufacturing line]
Author :
Bunkofske, Raymond J. ; Pascoe, Nancy Tovey ; Colt, John Z. ; Smit, Michael W.
Author_Institution :
IBM Microelectron. Div., Essex Junction, VT, USA
Abstract :
This paper discusses the building, installation and integration of a data acquisition and analysis system in a semiconductor manufacturing line known as the real time process monitoring system (RTPM). It describes how it has been integrated with the site logistics system, the statistical process control system, and the characterization data base to provide improved process control, increased tool availability, and enhanced yield learning
Keywords :
computerised monitoring; data acquisition; integrated circuit manufacture; manufacturing data processing; process control; production engineering computing; real-time systems; statistical process control; automated SPC; characterization database; data acquisition system; data analysis system; installation; real-time process monitoring; semiconductor manufacturing line; site logistics system; statistical process control system; tool availability; yield learning enhancement; Costs; Data acquisition; Data analysis; Local area networks; Manufacturing processes; Microelectronics; Monitoring; Process control; Semiconductor device manufacture; Software tools;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996
Conference_Location :
Cambridge, MA
Print_ISBN :
0-7803-3371-3
DOI :
10.1109/ASMC.1996.558090
