Synthesis of ultra-fine particles by surface discharge-induced plasma chemical process (SPCP) and its application

Surface discharge-induced plasma chemical process (SPCP) is a novel means of cold plasma processing possible under normal temperature and pressure. Although the plasma layer is very thin, its electron energy is large enough to produce chemical vapor deposition (CVD) reactions. If a CVD reactive gas mixture is well contacted with the surface plasma region, it is activated to form ultrafine particles, even under ordinary temperature and atmospheric pressure. A comparison is made between the SPCP-CVD method and another type of cold plasma CVD using silent glow discharge (GPCP). In the GPCP-CVD system, two coaxial cylindrical electrodes are used in combination with two coaxial quartz tubes spaced at a small gap to generate silent discharge in the gap. In the SPCP-CVD system, a ceramic-made electrode assembly is used, where a high frequency and high voltage are applied to form an energetic and stable surface discharge.<>