DocumentCode
2253620
Title
Zirconium diboride low resistance layers
Author
Andreeva, A.F. ; Statsenko, V.M. ; Klotchkov, L.A.
Author_Institution
Inst. of Problems in Mater. Sci., Acad. of Sci., Kiev, Ukraine
fYear
1997
fDate
16-19 March 1997
Firstpage
217
Lastpage
218
Abstract
The ion-plasma sputtering method, as we see it, is perspective for the zirconium diboride thin films production. The literature sources on the zirconium diboride thin films growth characteristics are sparse. The goal of this paper is to investigate the possibility of the zirconium diboride thin films production with the magnetron sputtering method and to investigate its structure and physical properties.
Keywords
electrical resistivity; metallic thin films; sputtered coatings; zirconium compounds; ZrB/sub 2/; ion-plasma sputtering; magnetron sputtering; resistance; structure; thin film growth; zirconium diboride; Annealing; Chemicals; Circuit stability; Electric resistance; Sputtering; Temperature; Thermal stability; Thin film circuits; Transistors; Zirconium;
fLanguage
English
Publisher
ieee
Conference_Titel
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location
Villard de Lans, France
ISSN
1266-0167
Type
conf
DOI
10.1109/MAM.1997.621129
Filename
621129
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