DocumentCode
2253806
Title
Application of high ϵ paramagnetic and ferroelectric materials to high-transconductance HFETs with low noise and low gate current [InGaAs-AlGaAs devices]
Author
Handel, P. ; Zuleeg, R.
Author_Institution
Dept. of Phys. & Astron., Missouri Univ., St. Louis, MO, USA
fYear
1997
fDate
6-11 Jan 1997
Firstpage
31
Lastpage
36
Abstract
Paraelectric or hysteresis-free ferroelectric gate insulation is ideal for special HFETs meeting bandwidth requirements from 0 to 100 GHz. It allows total suppression of gate leakage currents, while also assuring a large increase in the transconductance of the device at frequencies under 100 MHz, where the permittivity is still high. The gradual decrease of ε in the UHF region is actually very useful, since it limits the free fall of the input impedance of the device to zero, which would load the source excessively. Finally, the lower temperature BaMgF4 technology avoids oxidation and degradation of the compound semiconductors, and a further improvement in ε through mobile ferroelectric micro-domains is possible by optimizing the growth conditions
Keywords
1/f noise; III-V semiconductors; aluminium compounds; barium compounds; ferroelectric materials; ferroelectric thin films; gallium arsenide; indium compounds; insulated gate field effect transistors; leakage currents; semiconductor device noise; 0 to 100 GHz; 1/f noise; BaMgF4; InGaAs-AlGaAs; UHF region; bandwidth requirements; gate leakage currents; high-transconductance HFETs; hysteresis-free ferroelectric gate insulation; mobile ferroelectric micro-domains; Bandwidth; Ferroelectric materials; Frequency; HEMTs; Hysteresis; Insulation; Leakage current; MODFETs; Paramagnetic materials; Transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Frontiers in Electronics, 1997. WOFE '97. Proceedings., 1997 Advanced Workshop on
Conference_Location
Puerto de la Cruz
Print_ISBN
0-7803-4059-0
Type
conf
DOI
10.1109/WOFE.1997.621139
Filename
621139
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