DocumentCode
2254063
Title
Photo-patternable gelatin as protection layers in surface micromachinings
Author
Lung-Jieh Yang ; Wei-Zhi Lin ; Tze-Jung Yao ; Yu-Chong Tai
Author_Institution
Dept. of Mech. Eng., Tamkang Univ., Tamsui, Taiwan
fYear
2002
fDate
24-24 Jan. 2002
Firstpage
471
Lastpage
474
Abstract
This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
Keywords
gelatin; micromachining; photoresists; protective coatings; Parylene MEMS technology; low-temperature photopatternable gelatin technology; photoresist; protection layer; strengthening layer; surface micromachining; Chemical technology; Coatings; Fabrication; Food technology; Mechanical engineering; Micromachining; Micromechanical devices; Protection; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location
Las Vegas, NV, USA
ISSN
1084-6999
Print_ISBN
0-7803-7185-2
Type
conf
DOI
10.1109/MEMSYS.2002.984304
Filename
984304
Link To Document