Title :
Micro flow patterns on demand using surface-chemistry technology
Author :
Winky Lap Wing Hau ; Trau, D.W. ; Sucher, N.J. ; Man Wong ; Zohar, Y.
Author_Institution :
Dept. of Mech. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Abstract :
A new technology to pattern surface charges, either negatively or positively, using a standard photolithography process is introduced. Unlimited flow patterns can be generated under an externally applied electric field by electro-osmotic and electrophoretic driving forces to enable fine control of fluid motion in microfluidic devices. Two basic flows, shear and vortical, have been realized experimentally to demonstrate the tremendous potential of this technology, especially in analytical microsystems for genomics or cell biology.
Keywords :
electrophoresis; microfluidics; photolithography; shear flow; surface chemistry; vortices; analytical microsystems; electro-osmotic driving forces; electrophoretic driving forces; externally applied electric field; fluid motion; micro flow patterns; shear flows; standard photolithography process; surface chemistry technology; vortical flows; Biotechnology; Chemical technology; Coatings; Glass; Lithography; Microfluidics; Micropumps; Silicon compounds; Substrates; Surface treatment;
Conference_Titel :
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7185-2
DOI :
10.1109/MEMSYS.2002.984305
