• DocumentCode
    2254350
  • Title

    Microlens fabrication by the modified LIGA process

  • Author

    Sung-Keun Lee ; Kwang-Cheol Lee ; Lee, S.S.

  • Author_Institution
    Dept. of Mech. Eng., Pohang Univ. of Sci. & Technol., South Korea
  • fYear
    2002
  • fDate
    24-24 Jan. 2002
  • Firstpage
    520
  • Lastpage
    523
  • Abstract
    A microlens or microlenses array has been fabricated by a novel fabrication technology which is based upon a deep X-ray exposure and a thermal treatment of a resist, usually PMMA. The fabrication technology is very simple and produces the microlenses array as well as the microlens which has good surface roughness less than I nm. Molecular weight and glass transition temperature of PMMA is reduced when it is exposed to the deep X-ray. The microlens is produced through the effect of surface tension and reflow by applying the thermal treatment on the irradiated PMMA. A configuration of the microlens is determined by parameters such as absorbed X-ray dose on PMMA, heating temperature, and heating time in the thermal treatment. Diameters of the produced microlens range from 30 /spl mu/m to 1500 /spl mu/m and their heights vary between 10 /spl mu/m and 25 /spl mu/m.
  • Keywords
    LIGA; X-ray lithography; annealing; microlenses; optical fabrication; resists; surface topography; 10 to 25 micron; 30 to 1500 micron; PMMA; absorbed X-ray dose; deep X-ray exposure; diameter 30 /spl mu/m to 1500 /spl mu/m; glass transition temperature; heating temperature; heating time; heights 10 /spl mu/m and 25 /spl mu/m; microlens; molecular weight; thermal treatment; Fabrication; Heat treatment; Lenses; Microoptics; Resists; Rough surfaces; Surface roughness; Surface treatment; Temperature; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7185-2
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2002.984323
  • Filename
    984323