DocumentCode
2255385
Title
Stiffness-compensated temperature-insensitive micromechanical resonators
Author
Wan-Thai Hsu ; Nguyen, C.T.-C.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear
2002
fDate
24-24 Jan. 2002
Firstpage
731
Lastpage
734
Abstract
Polysilicon /spl mu/mechanical resonators utilizing a novel temperature-dependent electrical stiffness design technique to compensate for temperature-induced frequency shifts have been demonstrated with greatly reduced temperature coefficients (TC/sub f/´s) on the order of -0.24 ppm//spl deg/C, which is 67 times smaller than exhibited by previous uncompensated resonators. With this new resonator design, the total frequency excursion over a 300 K to 380 K range has been reduced from 1,280 ppm for an uncompensated device to only 18 ppm, which for the first time, is now small enough to erase lingering concerns regarding the temperature stability of MEMS-based resonators for use in communication applications.
Keywords
compensation; elemental semiconductors; micromechanical resonators; silicon; 300 to 380 K; MEMS technology; Si; electrical stiffness compensation; frequency shift; polysilicon micromechanical resonator; temperature coefficient; temperature stability; Band pass filters; Electrodes; Energy consumption; Micromechanical devices; Oscillators; Resonant frequency; Stability; Temperature dependence; Temperature distribution; Transceivers;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
Conference_Location
Las Vegas, NV, USA
ISSN
1084-6999
Print_ISBN
0-7803-7185-2
Type
conf
DOI
10.1109/MEMSYS.2002.984374
Filename
984374
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