• DocumentCode
    2255385
  • Title

    Stiffness-compensated temperature-insensitive micromechanical resonators

  • Author

    Wan-Thai Hsu ; Nguyen, C.T.-C.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
  • fYear
    2002
  • fDate
    24-24 Jan. 2002
  • Firstpage
    731
  • Lastpage
    734
  • Abstract
    Polysilicon /spl mu/mechanical resonators utilizing a novel temperature-dependent electrical stiffness design technique to compensate for temperature-induced frequency shifts have been demonstrated with greatly reduced temperature coefficients (TC/sub f/´s) on the order of -0.24 ppm//spl deg/C, which is 67 times smaller than exhibited by previous uncompensated resonators. With this new resonator design, the total frequency excursion over a 300 K to 380 K range has been reduced from 1,280 ppm for an uncompensated device to only 18 ppm, which for the first time, is now small enough to erase lingering concerns regarding the temperature stability of MEMS-based resonators for use in communication applications.
  • Keywords
    compensation; elemental semiconductors; micromechanical resonators; silicon; 300 to 380 K; MEMS technology; Si; electrical stiffness compensation; frequency shift; polysilicon micromechanical resonator; temperature coefficient; temperature stability; Band pass filters; Electrodes; Energy consumption; Micromechanical devices; Oscillators; Resonant frequency; Stability; Temperature dependence; Temperature distribution; Transceivers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7185-2
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2002.984374
  • Filename
    984374