DocumentCode
2255438
Title
Modeling of carrier density and quantum capacitance in graphene nanoribbon FETs
Author
Kliros, George S.
Author_Institution
Dept. of Aeronaut. Sci., Hellenic Air-Force Acad., Dekeleia AFB, Greece
fYear
2010
fDate
19-22 Dec. 2010
Firstpage
236
Lastpage
239
Abstract
Gate voltage control of carrier density and quantum capacitance is an important step for understanding the device physics and assessing the performance of nanoscale transistors. In this paper, we present a simple phenomenological model for the carrier density and quantum capacitance of graphene nanoribbon field-effect transistors as functions of gate voltage, Fermi level position and temperature. Quantum capacitance is calculated from the broadened density of states incorporating the presence of electron-hole puddles and possible finite lifetime of electronic states through a Gaussian broadening distribution. Thin gate-insulators of high-κ dielectric constant are used in our calculations in order to approach the quantum capacitance limit.
Keywords
carrier density; field effect transistors; Fermi level position; Gaussian broadening distribution; carrier density; electron-hole puddles; electronic state; finite lifetime; gate voltage control; graphene nanoribbon FET; graphene nanoribbon field-effect transistor; nanoscale transistor; quantum capacitance limit; thin gate-insulator; Insulators; Logic gates; Photonic band gap; Quantum capacitance; Temperature; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics (ICM), 2010 International Conference on
Conference_Location
Cairo
Print_ISBN
978-1-61284-149-6
Type
conf
DOI
10.1109/ICM.2010.5696126
Filename
5696126
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