• DocumentCode
    2255438
  • Title

    Modeling of carrier density and quantum capacitance in graphene nanoribbon FETs

  • Author

    Kliros, George S.

  • Author_Institution
    Dept. of Aeronaut. Sci., Hellenic Air-Force Acad., Dekeleia AFB, Greece
  • fYear
    2010
  • fDate
    19-22 Dec. 2010
  • Firstpage
    236
  • Lastpage
    239
  • Abstract
    Gate voltage control of carrier density and quantum capacitance is an important step for understanding the device physics and assessing the performance of nanoscale transistors. In this paper, we present a simple phenomenological model for the carrier density and quantum capacitance of graphene nanoribbon field-effect transistors as functions of gate voltage, Fermi level position and temperature. Quantum capacitance is calculated from the broadened density of states incorporating the presence of electron-hole puddles and possible finite lifetime of electronic states through a Gaussian broadening distribution. Thin gate-insulators of high-κ dielectric constant are used in our calculations in order to approach the quantum capacitance limit.
  • Keywords
    carrier density; field effect transistors; Fermi level position; Gaussian broadening distribution; carrier density; electron-hole puddles; electronic state; finite lifetime; gate voltage control; graphene nanoribbon FET; graphene nanoribbon field-effect transistor; nanoscale transistor; quantum capacitance limit; thin gate-insulator; Insulators; Logic gates; Photonic band gap; Quantum capacitance; Temperature; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics (ICM), 2010 International Conference on
  • Conference_Location
    Cairo
  • Print_ISBN
    978-1-61284-149-6
  • Type

    conf

  • DOI
    10.1109/ICM.2010.5696126
  • Filename
    5696126