• DocumentCode
    2256292
  • Title

    Faster CMOS inverter switching obtained with channel engineered asymmetrical halo implanted MOSFETs

  • Author

    Akturk, Akin ; Goldsman, Neil ; Metze, George

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Maryland Univ., College Park, MD, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    118
  • Lastpage
    121
  • Abstract
    Asymmetrically doped CMOS inverters have been designed. A mixed mode device/circuit simulator has been developed to analyze the new designs. Results show that the asymmetrically doped devices can give rise to inverter switching speeds which are several times faster than those composed of conventional CMOS. Such an increase should translate directly to similar increases in computer processor speeds. The asymmetrical designs could be achieved by changing only a few steps in an already existing CMOS process, and could therefore be used to extend the life of an existing technology, and thus save from having to construct prohibitively expensive fabrication facilities
  • Keywords
    CMOS integrated circuits; circuit simulation; digital simulation; integrated circuit modelling; invertors; semiconductor device models; switching circuits; CMOS inverter; CMOS process technology; Si; asymmetrical design; channel engineered asymmetrical halo implanted MOSFETs; computer processor speed; inverter switching speed; mixed mode device/circuit simulator; Analytical models; Circuit noise; Circuit simulation; Doping; Implants; Inverters; Kirchhoff´s Law; MOSFETs; Transient analysis; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2001 International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    0-7803-7432-0
  • Type

    conf

  • DOI
    10.1109/ISDRS.2001.984453
  • Filename
    984453