DocumentCode
2256292
Title
Faster CMOS inverter switching obtained with channel engineered asymmetrical halo implanted MOSFETs
Author
Akturk, Akin ; Goldsman, Neil ; Metze, George
Author_Institution
Dept. of Electr. & Comput. Eng., Maryland Univ., College Park, MD, USA
fYear
2001
fDate
2001
Firstpage
118
Lastpage
121
Abstract
Asymmetrically doped CMOS inverters have been designed. A mixed mode device/circuit simulator has been developed to analyze the new designs. Results show that the asymmetrically doped devices can give rise to inverter switching speeds which are several times faster than those composed of conventional CMOS. Such an increase should translate directly to similar increases in computer processor speeds. The asymmetrical designs could be achieved by changing only a few steps in an already existing CMOS process, and could therefore be used to extend the life of an existing technology, and thus save from having to construct prohibitively expensive fabrication facilities
Keywords
CMOS integrated circuits; circuit simulation; digital simulation; integrated circuit modelling; invertors; semiconductor device models; switching circuits; CMOS inverter; CMOS process technology; Si; asymmetrical design; channel engineered asymmetrical halo implanted MOSFETs; computer processor speed; inverter switching speed; mixed mode device/circuit simulator; Analytical models; Circuit noise; Circuit simulation; Doping; Implants; Inverters; Kirchhoff´s Law; MOSFETs; Transient analysis; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2001 International
Conference_Location
Washington, DC
Print_ISBN
0-7803-7432-0
Type
conf
DOI
10.1109/ISDRS.2001.984453
Filename
984453
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