• DocumentCode
    2257049
  • Title

    Modeling of GaN MESFETs at high temperature

  • Author

    Shashikala, B.N. ; Nagabhushana, B.S.

  • Author_Institution
    Siddaganga Inst. of Technol., Tumkur, India
  • fYear
    2010
  • fDate
    19-22 Dec. 2010
  • Firstpage
    511
  • Lastpage
    514
  • Abstract
    The ability of Gallium Nitride (GaN) MESFET to operate over a wide temperature range requires accurate models to simulate the temperature dependence of various device parameters. In this paper, a new temperature dependent analytical model for the threshold voltage of GaN MESFETs is introduced. The contributions from various temperature dependent material parameters are taken into account in order to develop an accurate I-V model along with the effect of gate leakage current on the threshold voltage of the device. The model is further extended to predict the temperature dependence of transconductance. The model shows excellent agreement with the published experimental results for a 0.25μm device.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium compounds; leakage currents; semiconductor device models; GaN; I-V model; MESFET modeling; gallium nitride; gate leakage current; temperature-dependent analytical model; threshold voltage; transconductance; GaN; MESFET; model; threshold voltage; transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics (ICM), 2010 International Conference on
  • Conference_Location
    Cairo
  • Print_ISBN
    978-1-61284-149-6
  • Type

    conf

  • DOI
    10.1109/ICM.2010.5696202
  • Filename
    5696202