DocumentCode
2257049
Title
Modeling of GaN MESFETs at high temperature
Author
Shashikala, B.N. ; Nagabhushana, B.S.
Author_Institution
Siddaganga Inst. of Technol., Tumkur, India
fYear
2010
fDate
19-22 Dec. 2010
Firstpage
511
Lastpage
514
Abstract
The ability of Gallium Nitride (GaN) MESFET to operate over a wide temperature range requires accurate models to simulate the temperature dependence of various device parameters. In this paper, a new temperature dependent analytical model for the threshold voltage of GaN MESFETs is introduced. The contributions from various temperature dependent material parameters are taken into account in order to develop an accurate I-V model along with the effect of gate leakage current on the threshold voltage of the device. The model is further extended to predict the temperature dependence of transconductance. The model shows excellent agreement with the published experimental results for a 0.25μm device.
Keywords
III-V semiconductors; Schottky gate field effect transistors; gallium compounds; leakage currents; semiconductor device models; GaN; I-V model; MESFET modeling; gallium nitride; gate leakage current; temperature-dependent analytical model; threshold voltage; transconductance; GaN; MESFET; model; threshold voltage; transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics (ICM), 2010 International Conference on
Conference_Location
Cairo
Print_ISBN
978-1-61284-149-6
Type
conf
DOI
10.1109/ICM.2010.5696202
Filename
5696202
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