DocumentCode
2257289
Title
GaAs-Ge non-planar composite epitaxial heterostructures: LPE growth and cathodoluminescence investigations
Author
Ulin, V.P. ; Zamoryanskaya, M.V. ; Soldotenkov, F.Yu. ; Popova, T.B. ; Konnikov, S.G.
Author_Institution
A.F. Ioffe Phys. Tech. Inst., St. Petersburg, Russia
fYear
2001
fDate
2001
Firstpage
301
Lastpage
304
Abstract
The composite non-planar GaAs-Ge n-p heterostructures were obtained by liquid phase epitaxy (LPE) of Ge on the porous GaAs(111)B and (100) substrates from Ga-Ge solution. The porous layers were prepared by the anodic electrochemical etching. The capillary effect leads to initial crystallization of Ge in the pores and the formation of the intermixed region between the GaAs substrate and the Ge epilayer. The volume p-n heterostructure was studied by the local cathodoluminescence and scanning electron microscopy. The CL investigation in the IR and visible ranges shows the effective separation of the charge carriers on this volume p-n junction
Keywords
III-V semiconductors; cathodoluminescence; elemental semiconductors; gallium arsenide; germanium; interface structure; liquid phase epitaxial growth; porous semiconductors; scanning electron microscopy; semiconductor epitaxial layers; semiconductor growth; semiconductor heterojunctions; GaAs substrate; GaAs-Ge; GaAs-Ge non-planar composite epitaxial heterostructures; Ge epilayer; LPE growth; anodic electrochemical etching; capillary effect; cathodoluminescence; charge carriers effective separation; initial crystallization; intermixed region; liquid phase epitaxy; pores; scanning electron microscopy; volume p-n heterostructure; Charge carriers; Crystalline materials; Crystallization; Epitaxial growth; Etching; Gallium arsenide; Quantum dots; Semiconductor materials; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2001 International
Conference_Location
Washington, DC
Print_ISBN
0-7803-7432-0
Type
conf
DOI
10.1109/ISDRS.2001.984500
Filename
984500
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