DocumentCode
2258873
Title
On the efficacy of write-assist techniques in low voltage nanoscale SRAMs
Author
Chandra, Vikas ; Pietrzyk, Cezary ; Aitken, Robert
Author_Institution
ARM R&D, San Jose, CA, USA
fYear
2010
fDate
8-12 March 2010
Firstpage
345
Lastpage
350
Abstract
Read and write assist techniques are now commonly used to lower the minimum operating voltage (Vmin) of an SRAM. In this paper, we review the efficacy of four leading write-assist (WA) techniques and their behavior at lower supply voltages in commercial SRAMs from 65nm, 45nm and 32nm low power technology nodes. In particular, the word-line boosting and negative bit-line WA techniques seem most promising at lower voltages. These two techniques help reduce the value of WLcrit by a factor of ~2.5X at 0.7V and also decrease the 3?? spread by ~3.3X, thus significantly reducing the impact of process variations. These write-assist techniques also impact the dynamic read noise margin (DRNM) of half-selected cells during the write operation. The negative bit-line WA technique has virtually no impact on the DRNM but all other WA techniques degrade the DRNM by 10-15%. In conjunction with the benefit (decrease in WLcrit) and the negative impact (decrease in DRNM), overhead of implementation in terms of area and performance must be analyzed to choose the best write-assist technique for lowering the SRAM Vmin.
Keywords
SRAM chips; low-power electronics; SRAM; dynamic read noise margin; low power technology; low voltage nanoscale; minimum operating voltage; negative bit-line WA techniques; read and write assist techniques; size 32 nm; size 45 nm; size 65 nm; word-line boosting; write-assist techniques; Boosting; Degradation; Dynamic voltage scaling; Low voltage; Performance analysis; Pulse measurements; Random access memory; Research and development; SRAM chips; Space vector pulse width modulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2010
Conference_Location
Dresden
ISSN
1530-1591
Print_ISBN
978-1-4244-7054-9
Type
conf
DOI
10.1109/DATE.2010.5457179
Filename
5457179
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