• DocumentCode
    2259076
  • Title

    The pH response of a silicon-on-insulator MOSFET with an integrated nanofluidic cell

  • Author

    Takulapalli, B.R. ; Thornton, Trevor J. ; Gust, D. ; Ashcroft, B. ; Lindsay, S.M. ; Zhang, H.Q. ; Tao, NJ

  • Author_Institution
    Center for Solid State Electron. Res., Arizona State Univ., Tempe, AZ, USA
  • fYear
    2003
  • fDate
    29 Sept.-2 Oct. 2003
  • Firstpage
    114
  • Lastpage
    116
  • Abstract
    In this paper, we study the pH response of a buried channel SOI MOSFET integrated with a nanofluidic cell. The surface of the device is exposed to solutions of different pH to validate the sensitivity of the device to different chemical and biological environments.
  • Keywords
    MOSFET; cells (electric); elemental semiconductors; microfluidics; nanotechnology; pH; sensitivity; silicon-on-insulator; surface treatment; SOI MOSFET; Si; biological environments; chemical environments; device surface; integrated nanofluidic cell; pH response; sensitivity; silicon-on-insulator MOSFET; Batteries; MOSFETs; Nanotechnology; Sensitivity; Silicon on insulator technology; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2003. IEEE International
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-7815-6
  • Type

    conf

  • DOI
    10.1109/SOI.2003.1242920
  • Filename
    1242920