DocumentCode :
2259390
Title :
4H- and 6H-SiC vertical static induction transistor with p-n junction as a gate
Author :
Sankin, V.I. ; Shkrebiy, P.P.
Author_Institution :
A.F. Ioffe Phys. Tech. Inst., St. Petersburg, Russia
fYear :
2001
fDate :
2001
Firstpage :
579
Lastpage :
582
Abstract :
Silicon carbide has attracted considerable interest as a material for high power, high frequency devices. The unique properties such as high thermal conductivity, anomaly large breakdown fields and others provide the potential for development of effective devices particularly in the microwave region. The development of a microwave SiC power transistor with vertical design is of great interest. Such a transistor has been formed with Schottky gate contact. We use a p-n junction instead of the Schottky gate contact and present its I-V characteristics
Keywords :
microwave power transistors; p-n junctions; semiconductor device breakdown; semiconductor device measurement; silicon compounds; wide band gap semiconductors; 4H-SiC; 6H-SiC; I-V characteristic; SiC; breakdown field; gate p-n junction; high frequency device; high power device; high thermal conductivity; microwave SiC power transistor; microwave region; silicon carbide; vertical static induction transistor; Conducting materials; Electric breakdown; Frequency; Microwave FETs; Microwave devices; Microwave transistors; P-n junctions; Power transistors; Silicon carbide; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2001 International
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-7432-0
Type :
conf
DOI :
10.1109/ISDRS.2001.984584
Filename :
984584
Link To Document :
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