Title :
Noninterferometric wide-field optical profilometry with nanometer depth resolution
Author :
Chau-Hwang Lee ; Wan-Chen Lin
Author_Institution :
Inst. of Appl. Sci. & Eng. Res., Acad. Sinica, Taipei, Taiwan
Abstract :
Summary from only given. We report a noninterferometric wide field optical profilometry with nanometer depth resolution. The working principle is similar to that of differential confocal microscopy (DCM), except that the axial response curve is generated by wide-field optical sectioning microscopy. Wide-field sectioning microscopy has an optically sectioning ability similar to that of confocal microscopy.
Keywords :
image resolution; optical focusing; optical microscopy; surface topography measurement; axial response curve; confocal microscopy; nanometer depth resolution; noninterferometric wide field optical profilometry; optically sectioning; wide-field optical sectioning microscopy; working principle; Dielectric measurements; Gratings; High speed optical techniques; Optical interferometry; Optical microscopy; Optical polarization; Optical sensors; Optimized production technology; Stokes parameters; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
DOI :
10.1109/CLEO.2002.1033395
