DocumentCode :
2261611
Title :
Fabrication of sharp conical microstructures on Si films by Nd:YAG-laser single-pulse irradiation
Author :
Moening, Joe P. ; Georgiev, Daniel G.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Toledo, Toledo, OH
fYear :
2008
fDate :
4-9 May 2008
Firstpage :
1
Lastpage :
2
Abstract :
Sharp Si micro-cones were obtained by single-pulse laser irradiation (Q-switched Nd:YAG, 4th harmonic), of thin crystalline Si films on insulating substrates. The formation is due to localized melting and is controllable with important technological implications.
Keywords :
elemental semiconductors; laser beam effects; laser materials processing; melting; semiconductor growth; semiconductor thin films; silicon; 4th harmonics; Q-switching; Si; Si films; insulating substrates; localized melting; sharp conical microstructures; single-pulse laser irradiation; Materials processing; Microstructure; Optical control; Optical device fabrication; Optical films; Optical pulses; Semiconductor films; Silicon; Substrates; Surface emitting lasers; (320.4240) Nanosecond phenomena; (350.3390) Laser materials processing; (350.3850) Materials processing;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-55752-859-9
Type :
conf
Filename :
4572571
Link To Document :
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