DocumentCode
2263126
Title
Novel light emitting diodes in silicon
Author
Homewood, K.P. ; Lourenco, Mateus A. ; Wai Lek Ng ; Gwilliam, R.M. ; Shao, Guangqi ; Ledain, S.
Author_Institution
Univ. of Surrey, UK
fYear
2002
fDate
24-24 May 2002
Abstract
Summary form only given. We describe a new approach dislocation engineering using crucially just conventional ULSI technology, to make efficient light emitting diodes (LEDs) in silicon operating at room temperature. Because of its indirect bandgap silicon is fundamentally a poor emitter of light. A way of enhancing the radiative efficiency would be to prevent the carrier diffusion. The method described here is to use the controlled introduction of dislocation loops by conventional ion implantation and thermal processing.
Keywords
ULSI; ion implantation; light emitting diodes; optical fabrication; silicon; LEDs; Si; ULSI; carrier diffusion; controlled introduction; dislocation loops; indirect bandgap silicon; ion implantation; light emitting diodes; poor light emitter; radiative efficiency; room temperature; silicon; thermal processing; Distributed Bragg reflectors; Distributed feedback devices; Gratings; Light emitting diodes; P-n junctions; Photonic band gap; Refractive index; Silicon; Temperature; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Long Beach, CA, USA
Print_ISBN
1-55752-706-7
Type
conf
DOI
10.1109/CLEO.2002.1033528
Filename
1033528
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