• DocumentCode
    2263126
  • Title

    Novel light emitting diodes in silicon

  • Author

    Homewood, K.P. ; Lourenco, Mateus A. ; Wai Lek Ng ; Gwilliam, R.M. ; Shao, Guangqi ; Ledain, S.

  • Author_Institution
    Univ. of Surrey, UK
  • fYear
    2002
  • fDate
    24-24 May 2002
  • Abstract
    Summary form only given. We describe a new approach dislocation engineering using crucially just conventional ULSI technology, to make efficient light emitting diodes (LEDs) in silicon operating at room temperature. Because of its indirect bandgap silicon is fundamentally a poor emitter of light. A way of enhancing the radiative efficiency would be to prevent the carrier diffusion. The method described here is to use the controlled introduction of dislocation loops by conventional ion implantation and thermal processing.
  • Keywords
    ULSI; ion implantation; light emitting diodes; optical fabrication; silicon; LEDs; Si; ULSI; carrier diffusion; controlled introduction; dislocation loops; indirect bandgap silicon; ion implantation; light emitting diodes; poor light emitter; radiative efficiency; room temperature; silicon; thermal processing; Distributed Bragg reflectors; Distributed feedback devices; Gratings; Light emitting diodes; P-n junctions; Photonic band gap; Refractive index; Silicon; Temperature; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
  • Conference_Location
    Long Beach, CA, USA
  • Print_ISBN
    1-55752-706-7
  • Type

    conf

  • DOI
    10.1109/CLEO.2002.1033528
  • Filename
    1033528