Title :
Novel light emitting diodes in silicon
Author :
Homewood, K.P. ; Lourenco, Mateus A. ; Wai Lek Ng ; Gwilliam, R.M. ; Shao, Guangqi ; Ledain, S.
Author_Institution :
Univ. of Surrey, UK
Abstract :
Summary form only given. We describe a new approach dislocation engineering using crucially just conventional ULSI technology, to make efficient light emitting diodes (LEDs) in silicon operating at room temperature. Because of its indirect bandgap silicon is fundamentally a poor emitter of light. A way of enhancing the radiative efficiency would be to prevent the carrier diffusion. The method described here is to use the controlled introduction of dislocation loops by conventional ion implantation and thermal processing.
Keywords :
ULSI; ion implantation; light emitting diodes; optical fabrication; silicon; LEDs; Si; ULSI; carrier diffusion; controlled introduction; dislocation loops; indirect bandgap silicon; ion implantation; light emitting diodes; poor light emitter; radiative efficiency; room temperature; silicon; thermal processing; Distributed Bragg reflectors; Distributed feedback devices; Gratings; Light emitting diodes; P-n junctions; Photonic band gap; Refractive index; Silicon; Temperature; Ultra large scale integration;
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
DOI :
10.1109/CLEO.2002.1033528