• DocumentCode
    2264532
  • Title

    Breakthrough in prototyping lead time by use of a photomask control plan

  • Author

    Osborne, P. ; Visser, Joost

  • fYear
    2003
  • fDate
    30 Sept.-2 Oct. 2003
  • Firstpage
    55
  • Lastpage
    58
  • Abstract
    To reduce prototype lead times Philips Semiconductors has introduced the Flying Dutchman (FD) concept in its 0.18 μm process technology. Based on industry-common methods, FD mainly discriminates itself by also removing virtually all in-line litho CD and overlay measurements from the process-flow, enabled by the use of high-quality photomasks that give predictable on-wafer results. A photomask control plan ensures that two or more of these photomasks can be obtained per day from our commercial mask vendor. As a result, FD reduces waferfab cycle-time to 0.35 days per maskstep.
  • Keywords
    lithography; masks; 0.18 micron; 0.35 day; Flying Dutchman concept; Philips semiconductors; photomask; prototyping lead time; wafer; Assembly; Lead compounds; Lead time reduction; Manufacturing processes; Optical control; Optical design; Prototypes; Semiconductor device manufacture; Silicon; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2003 IEEE International Symposium on
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7894-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2003.1243230
  • Filename
    1243230