DocumentCode
2264532
Title
Breakthrough in prototyping lead time by use of a photomask control plan
Author
Osborne, P. ; Visser, Joost
fYear
2003
fDate
30 Sept.-2 Oct. 2003
Firstpage
55
Lastpage
58
Abstract
To reduce prototype lead times Philips Semiconductors has introduced the Flying Dutchman (FD) concept in its 0.18 μm process technology. Based on industry-common methods, FD mainly discriminates itself by also removing virtually all in-line litho CD and overlay measurements from the process-flow, enabled by the use of high-quality photomasks that give predictable on-wafer results. A photomask control plan ensures that two or more of these photomasks can be obtained per day from our commercial mask vendor. As a result, FD reduces waferfab cycle-time to 0.35 days per maskstep.
Keywords
lithography; masks; 0.18 micron; 0.35 day; Flying Dutchman concept; Philips semiconductors; photomask; prototyping lead time; wafer; Assembly; Lead compounds; Lead time reduction; Manufacturing processes; Optical control; Optical design; Prototypes; Semiconductor device manufacture; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2003 IEEE International Symposium on
ISSN
1523-553X
Print_ISBN
0-7803-7894-6
Type
conf
DOI
10.1109/ISSM.2003.1243230
Filename
1243230
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