DocumentCode :
2264824
Title :
Fault detection and classification of plasma CVD tool
Author :
Wu, H.C. ; Chang, C.T. ; Chen, Bo-Hao ; Lee, C.Y. ; Chang, C.J. ; Zhou, M.S. ; Liang, M.S.
Author_Institution :
Taiwan Semicond. Manuf. Co. Ltd., Hsinchu, Taiwan
fYear :
2003
fDate :
30 Sept.-2 Oct. 2003
Firstpage :
123
Lastpage :
125
Abstract :
A fault detection and classification (FDC) study by means of principle component analysis (PCA) is conducted on a high density plasma (HDP) chemical vapor deposition (CVD) tool. The design of experiment (DOE) of gas flow and RF power effects is introduced to study the feasibility of PCA for FDC as well as to investigate the correlation of tool parameters. In this study, the first wafer effect of HDP CVD tool is identified and attributed to thermal system variation. It is shown that the PCA model is sensitive to detect (+/-)5% variation of tool parameters. It is also found that the fault space vector method might provide an approach for fault classification.
Keywords :
design of experiments; plasma CVD; principal component analysis; semiconductor device manufacture; semiconductor process modelling; tools; RF power effects; design of experiment; fault classification; fault detection; gas flow; high density plasma chemical vapor deposition tool; plasma CVD tool; principle component analysis; thermal system; tool parameters; wafer effect; Chemical analysis; Chemical vapor deposition; Fault detection; Fluid flow; Plasma chemistry; Plasma density; Principal component analysis; Radio frequency; Radiofrequency identification; US Department of Energy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
ISSN :
1523-553X
Print_ISBN :
0-7803-7894-6
Type :
conf
DOI :
10.1109/ISSM.2003.1243246
Filename :
1243246
Link To Document :
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