Title :
Parametric mismatch characterization for mixed-signal technologies
Author :
Tuinhout, Hans ; Wils, Nicole
Author_Institution :
NXP Semicond., Eindhoven, Netherlands
Abstract :
Systematic and random parametric mismatches are major performance limiters as well as notorious causes for re-designs of high precision mixed-signal circuits and systems. Therefore it is extremely important to measure, analyze, interpret, model and document parametric mismatch mechanisms. This paper provides an overview of the main requirements and techniques for mismatch characterization of active and passive IC devices in mixed-signal technologies.
Keywords :
mixed analogue-digital integrated circuits; IC devices; mixed-signal circuits; mixed-signal technologies; parametric mismatch characterization; Capacitors; Circuit synthesis; Circuit testing; Fluctuations; Integrated circuit measurements; Integrated circuit technology; Logic testing; Microscopy; Signal processing; Surfaces; Silicon device characterization; device modeling; matching; mismatch; random parametric mismatch fluctuations; systematic mismatch;
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2009. BCTM 2009. IEEE
Conference_Location :
Capri
Print_ISBN :
978-1-4244-4894-4
Electronic_ISBN :
1088-9299
DOI :
10.1109/BIPOL.2009.5314132
