Reduction of PFCs emission by using FMAT gas as CVD chambers cleaning gas

PFC´s (Perfluorocompounds) are widely used for CVD chambers clean, and have been associated with damage to the environment-atmosphere due to their infrared absorbance and long decomposition time. PFC´s impact to the environment is considered so significant, that Intel Corp. has decided to replace current cleaning procedures using PFCs (C₂F₆). This paper describes the research and development of a new clean procedure for a CVD process tool by using FMAT (C₄F₈O) gas, which allows dramatic reduction in PFC emission (∼90%).