DocumentCode :
2265617
Title :
An overview of the recent developments in high-voltage power semiconductor MOS-controlled bipolar devices
Author :
Ngwendson, L. ; Sweet, M.R. ; Narayanan, E. M Sankara
Author_Institution :
Electr. Machines & Drives Res. Group, Univ. of Sheffield, UK
fYear :
2009
fDate :
12-14 Oct. 2009
Firstpage :
198
Lastpage :
205
Abstract :
An overview of the recent developments in high-voltage power semiconductor MOS-controlled bipolar devices is presented. The insulated gate bipolar transistor (IGBT) technology is explored up to the latest state-of-the-art developments, in terms of cathode cell technology, drift region technology and anode design. MOS-gated thyristors, which are aimed to replace the IGBT are analysed. It is shown that in spite of the recent cathode cell developments to enhance the plasma distribution within the IGBT, a fully optimised MOS gated thyristor still remains the best approach to achieve enhanced Vce(sat) - Eoff trade-offs and negligible temperature coefficient of Vce(sat).
Keywords :
MIS devices; anodes; insulated gate bipolar transistors; thyristors; MOS-controlled bipolar devices; MOS-gated thyristors; anode design; cathode cell technology; drift region technology; high-voltage power semiconductor; insulated gate bipolar transistor; plasma distribution; Anodes; Bipolar transistors; Cathodes; Insulated gate bipolar transistors; MOSFET circuits; Plasma temperature; Power semiconductor devices; Switching loss; Thyristors; Voltage; CIGBT; Clustered IGBT; IGBT; MOS-gated Thyristor; TCIGBT;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting, 2009. BCTM 2009. IEEE
Conference_Location :
Capri
ISSN :
1088-9299
Print_ISBN :
978-1-4244-4894-4
Electronic_ISBN :
1088-9299
Type :
conf
DOI :
10.1109/BIPOL.2009.5314159
Filename :
5314159
Link To Document :
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