DocumentCode :
2266150
Title :
Monitoring and qualification using comprehensive surface haze information
Author :
Holsteyns, F. ; Roels, J. ; Kenis, K. ; Mertens, P.W.
Author_Institution :
IMEC, Heverlee, Belgium
fYear :
2003
fDate :
30 Sept.-2 Oct. 2003
Firstpage :
378
Lastpage :
381
Abstract :
Haze, the low frequency signal of light scattering, is already accessible in most fabs and contains very useful surface information. It can be used as a proxy for other metrology tools to measure thickness, reflectivity, roughness, defects,...and can be integrated in SPC tests for the equipment (given examples are W, Ta, oxide, small particles, surface treatments and sealing defects). When combined with particle measurements, it provides a full map and has very short process time. Also the calibration of the light scattering tools with haze reference wafers is addressed.
Keywords :
chemical vapour deposition; elemental semiconductors; etching; integrated circuit manufacture; light scattering; nanoparticles; process monitoring; reflectivity; silicon; statistical process control; surface roughness; tantalum; tantalum compounds; tungsten; SPC tests; Si; Ta-TaN; W; comprehensive surface haze information; fabs; light scattering; low frequency signal; metrology; monitoring; particle measurements; reflectivity; sealing defects; surface defects; surface roughness; surface treatment; Frequency; Light scattering; Metrology; Monitoring; Particle measurements; Qualifications; Rough surfaces; Surface roughness; Surface treatment; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
ISSN :
1523-553X
Print_ISBN :
0-7803-7894-6
Type :
conf
DOI :
10.1109/ISSM.2003.1243307
Filename :
1243307
Link To Document :
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