• DocumentCode
    2266564
  • Title

    Build-up technology of a new ultrapure water supplying system

  • Author

    Okumura, Minoru ; Ohmi, Tadahiro

  • Author_Institution
    Kurita Water Ind. Ltd., Tokyo, Japan
  • fYear
    2003
  • fDate
    30 Sept.-2 Oct. 2003
  • Firstpage
    475
  • Lastpage
    478
  • Abstract
    We have consumed a month for build-up time of a new supplying system of ultrapure water (UPW), which has been used for wafer cleaning. The reason for this is that a build-up time for the number of particles in UPW would be slow. Therefore, alkaline water cleaning was applied to a new UPW supplying system before H2O2 cleaning for sterilization, so that build-up time for the new UPW supplying system could be cut down to 1/3 compared to that for a conventional UPW supplying system.
  • Keywords
    electrokinetic effects; integrated circuit manufacture; pH control; production materials; sulphur; surface cleaning; surface contamination; water; water supply; H2O; H2O2 cleaning; S; UPW supplying system; build-up technology; sterilization; ultrapure water supplying system; wafer cleaning; Cleaning; Control systems; Electrostatics; Gases; Monitoring; Production; Semiconductor device manufacture; Vibrations; Water pollution; Water resources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2003 IEEE International Symposium on
  • ISSN
    1523-553X
  • Print_ISBN
    0-7803-7894-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2003.1243330
  • Filename
    1243330
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2266564