Title :
Build-up technology of a new ultrapure water supplying system
Author :
Okumura, Minoru ; Ohmi, Tadahiro
Author_Institution :
Kurita Water Ind. Ltd., Tokyo, Japan
fDate :
30 Sept.-2 Oct. 2003
Abstract :
We have consumed a month for build-up time of a new supplying system of ultrapure water (UPW), which has been used for wafer cleaning. The reason for this is that a build-up time for the number of particles in UPW would be slow. Therefore, alkaline water cleaning was applied to a new UPW supplying system before H2O2 cleaning for sterilization, so that build-up time for the new UPW supplying system could be cut down to 1/3 compared to that for a conventional UPW supplying system.
Keywords :
electrokinetic effects; integrated circuit manufacture; pH control; production materials; sulphur; surface cleaning; surface contamination; water; water supply; H2O; H2O2 cleaning; S; UPW supplying system; build-up technology; sterilization; ultrapure water supplying system; wafer cleaning; Cleaning; Control systems; Electrostatics; Gases; Monitoring; Production; Semiconductor device manufacture; Vibrations; Water pollution; Water resources;
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
Print_ISBN :
0-7803-7894-6
DOI :
10.1109/ISSM.2003.1243330
