Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide

Author

Crunteanu, A. ; Jahnchen, G. ; Salathe, R.R. ; Hoffmann, P. ; Pollnau, M. ; Eason, R.W. ; Shepherd, D.R.

Author_Institution

Inst. of Appl. Opt., Swiss Fed. Inst. of Technol., Lausanne, Switzerland

fYear

2002

fDate

24-24 May 2002

Abstract

Summary form only given. We report, to our knowledge, the first channel-waveguide emission from a Ti:sapphire structure. We engraved channels of 1.4-/spl mu/m depth in a 10-/spl mu/m thick Ti(0.1%):sapphire planar waveguide by reactive ion etching (RIE). RIE is a well-established method for patterning semiconductor materials.

Keywords

optical fabrication; optical planar waveguides; optical pumping; sapphire; solid lasers; sputter etching; titanium; waveguide lasers; 1.4 micron; 10 micron; Al/sub 2/O/sub 3/:Ti; Ti:sapphire structure; channel-waveguide emission; engraved channels; optical planar waveguide fabrication; reactive ion etching; sapphire planar waveguide; semiconductor materials patterning; solid laser waveguides; Etching; Optical interferometry; Optical planar waveguides; Optical pumping; Optical waveguides; Optimized production technology; Planar waveguides; Pulsed laser deposition; Surface emitting lasers; Waveguide lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the

Conference_Location

Long Beach, CA, USA

Print_ISBN

1-55752-706-7

Type

conf

DOI

10.1109/CLEO.2002.1033928

Filename

1033928