Title :
Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide
Author :
Crunteanu, A. ; Jahnchen, G. ; Salathe, R.R. ; Hoffmann, P. ; Pollnau, M. ; Eason, R.W. ; Shepherd, D.R.
Author_Institution :
Inst. of Appl. Opt., Swiss Fed. Inst. of Technol., Lausanne, Switzerland
Abstract :
Summary form only given. We report, to our knowledge, the first channel-waveguide emission from a Ti:sapphire structure. We engraved channels of 1.4-/spl mu/m depth in a 10-/spl mu/m thick Ti(0.1%):sapphire planar waveguide by reactive ion etching (RIE). RIE is a well-established method for patterning semiconductor materials.
Keywords :
optical fabrication; optical planar waveguides; optical pumping; sapphire; solid lasers; sputter etching; titanium; waveguide lasers; 1.4 micron; 10 micron; Al/sub 2/O/sub 3/:Ti; Ti:sapphire structure; channel-waveguide emission; engraved channels; optical planar waveguide fabrication; reactive ion etching; sapphire planar waveguide; semiconductor materials patterning; solid laser waveguides; Etching; Optical interferometry; Optical planar waveguides; Optical pumping; Optical waveguides; Optimized production technology; Planar waveguides; Pulsed laser deposition; Surface emitting lasers; Waveguide lasers;
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
DOI :
10.1109/CLEO.2002.1033928
