DocumentCode
2266825
Title
Growth temperature and composition effects in InGaAsN quantum wells for GaAs-based 1300 nm emitters
Author
Klem, John F. ; Serkland, D.K. ; Geib, K.M.
Author_Institution
Sandia Nat. Labs., Albuquerque, NM, USA
fYear
2002
fDate
24-24 May 2002
Firstpage
268
Abstract
Summary form only given. We have examined the photoluminescence properties of InGaAsN quantum wells as a method of improving the performance of GaAs-based 1300 nm lasers. Among the parameters that significantly affect the quality of this material, growth temperature and In/N ratio of the alloy have particularly profound effects. Substantially lower growth temperatures than normally used for GaAs or InGaAs materials appear to enhance the quality of this alloy, while In fractions of 0.3-0.35 result in an acceptable compromise between quantum well strain and optical quality.
Keywords
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; photoluminescence; quantum well lasers; semiconductor quantum wells; 1300 nm; GaAs materials; GaAs-based 1300 nm lasers; In fractions; In/N ratio; InGaAs materials; InGaAsN; InGaAsN quantum wells; growth temperature; optical quality; photoluminescence properties; quantum well strain; Chemical lasers; Electrons; Gallium arsenide; Photoluminescence; Quantum well lasers; Semiconductor lasers; Stimulated emission; Surface emitting lasers; Temperature; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Long Beach, CA, USA
Print_ISBN
1-55752-706-7
Type
conf
DOI
10.1109/CLEO.2002.1033932
Filename
1033932
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