• DocumentCode
    2266825
  • Title

    Growth temperature and composition effects in InGaAsN quantum wells for GaAs-based 1300 nm emitters

  • Author

    Klem, John F. ; Serkland, D.K. ; Geib, K.M.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    2002
  • fDate
    24-24 May 2002
  • Firstpage
    268
  • Abstract
    Summary form only given. We have examined the photoluminescence properties of InGaAsN quantum wells as a method of improving the performance of GaAs-based 1300 nm lasers. Among the parameters that significantly affect the quality of this material, growth temperature and In/N ratio of the alloy have particularly profound effects. Substantially lower growth temperatures than normally used for GaAs or InGaAs materials appear to enhance the quality of this alloy, while In fractions of 0.3-0.35 result in an acceptable compromise between quantum well strain and optical quality.
  • Keywords
    III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; photoluminescence; quantum well lasers; semiconductor quantum wells; 1300 nm; GaAs materials; GaAs-based 1300 nm lasers; In fractions; In/N ratio; InGaAs materials; InGaAsN; InGaAsN quantum wells; growth temperature; optical quality; photoluminescence properties; quantum well strain; Chemical lasers; Electrons; Gallium arsenide; Photoluminescence; Quantum well lasers; Semiconductor lasers; Stimulated emission; Surface emitting lasers; Temperature; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
  • Conference_Location
    Long Beach, CA, USA
  • Print_ISBN
    1-55752-706-7
  • Type

    conf

  • DOI
    10.1109/CLEO.2002.1033932
  • Filename
    1033932