DocumentCode
2268998
Title
Resonantly enhanced near-field lithography
Author
Tsang, Mankei ; Psaltis, Demetri
Author_Institution
Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA
fYear
2008
fDate
4-9 May 2008
Firstpage
1
Lastpage
2
Abstract
We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator.
Keywords
lenses; optical fabrication; optical resonators; photolithography; Bessel resonance modes; planar optical resonator; resonantly enhanced noncontact near-field lithography; solid immersion lens; subwavelength small spots; Dielectric losses; Lenses; Lithography; Optical imaging; Optical resonators; Optical surface waves; Photonic crystals; Resists; Resonance; Solids; (110.4235) Nanolithography; (230.5750) Resonators;
fLanguage
English
Publisher
iet
Conference_Titel
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-55752-859-9
Type
conf
Filename
4572940
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