DocumentCode
2269309
Title
Modelling of profile effects for inductive helicon plasma sources
Author
Mouzouris, Y. ; Scharer, John E. ; Bettenhausen, H.
Author_Institution
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
fYear
1995
fDate
5-8 June 1995
Firstpage
129
Abstract
Summary form only given, as follows. A computer code for modelling existing and new helicon sources has been developed and results are presented. The Nagoya type-III, helical and Stix coil antennas have been modelled to study and examine plasma density and temperature profile effects on power absorption of a small fraction (n/sub fe//n/sub e//spl ap/5%) of ionizing fast electrons (T/sub e-fast//spl sim/40 eV) and bulk (T/sub e-slow//spl sim/3 eV) electron distributions in an argon gas. The competing effects of collisional and Landau damping heating mechanisms have been investigated, as well as the scaling of the plasma source radius on RF power deposition. The "ANTENA" computer code to study ion cyclotron waves, was modified and used to study and model helicon sources. A collisional model that includes radial density and temperature profiles was added to the code to study the effect of collisions on the heating mechanisms. Detailed studies of the effects of plasma density and temperature radial profiles on radiofrequency wave absorption are considered. The influence of m=0, +1 and higher order modes on the heating profile for different helicon sources is presented. Preliminary studies of the plasma transport between the source and the wafer region are also presented.
Keywords
antennas in plasma; modelling; physics computing; plasma collision processes; plasma density; plasma diagnostics; plasma heating; plasma production; plasma temperature; plasma transport processes; temperature; 3 eV; 40 eV; ANTENA computer code; Ar; Ar gas; Landau damping heating; Nagoya type-III antenna; RF power deposition; Stix coil antenna; collisional heating; computer code; electron distributions; helical antenna; inductive helicon plasma sources; ion cyclotron waves; ionizing fast electrons; modelling; plasma density; plasma temperature; plasma transport; power absorption; profile effects; radiofrequency wave absorption; Absorption; Coils; Electrons; Heating; Helical antennas; Plasma density; Plasma sources; Plasma temperature; Radio frequency; Temperature distribution;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.531548
Filename
531548
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