• DocumentCode
    2270077
  • Title

    Sub-mW Operation of InP HEMT X-Band Low-Noise Amplifiers for Low Power Applications

  • Author

    Lin, C.H. ; Mei, X.B. ; Chou, Y.C. ; Lee, L.S. ; Yang, J.M. ; Nishimoto, M.Y. ; Liu, P.H. ; To, R. ; Cavus, A. ; Tsai, R. ; Wojtowicz, M. ; Lai, R.

  • Author_Institution
    Northrop Grumman Corp., Redondo Beach, CA, USA
  • fYear
    2009
  • fDate
    11-14 Oct. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    For the first time, the sub-mW operation of InP HEMT X-band low-noise amplifiers on 4-inch InP wafer was demonstrated. With optimized non-alloyed ohmic contact, gate recess profile and epitaxial layer design, the InP HEMT achieves average peak transconductance of 1150 mS/mm at VDS = 0.3 V. The mean current cut off frequency is above 150 GHz at VDS = 0.3 V and IDS = 150 mA/mm. The developed low power InP HEMTs enables the manufacturing of low-noise amplifiers for low power applications. The superior performance of X-band low-noise amplifiers was also demonstrated. Operating at a supply voltage of 0.25 V and drain current of 3.75 mA with DC power of 0.937 mW, the low noise amplifier exhibits noise figure of 1.6 dB and gain of 11 dB at frequencies from 6 to 12 GHz.
  • Keywords
    high electron mobility transistors; low noise amplifiers; low-power electronics; ohmic contacts; HEMT; X-band low noise amplifiers; average peak transconductance; current 3.75 mA; epitaxial layer design; frequency 6 GHz to 12 GHz; gain 11 dB; gate recess profile; high electron mobility transistors; low power application; mean current cut off frequency; noise figure 1.6 dB; optimized non-alloyed ohmic contact; power 0.937 mW; size 4 inch; voltage 0.25 V; voltage 0.3 V; Design optimization; Epitaxial layers; Frequency; HEMTs; Indium phosphide; Low-noise amplifiers; Manufacturing; Noise figure; Ohmic contacts; Transconductance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Integrated Circuit Symposium, 2009. CISC 2009. Annual IEEE
  • Conference_Location
    Greensboro, NC
  • ISSN
    1550-8781
  • Print_ISBN
    978-1-4244-5191-3
  • Electronic_ISBN
    1550-8781
  • Type

    conf

  • DOI
    10.1109/csics.2009.5315662
  • Filename
    5315662