Title :
Energetic electron detection by a time-sampled Langmuir probe in a helicon plasma source
Author :
Chen, R.T.S. ; Sandstrom, P.W. ; Hershkowitz, Noah
Author_Institution :
Eng. Res. Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA
Abstract :
Summary form only given, as follows. In an RF plasma, ordinary time-average Langmuir probe traces can be distorted by RF perturbations. Experimentally we found that the effect of RF perturbations on the probe traces becomes secondary or ignorable if the plasma density is high enough. In these small RF perturbation situations, we have detected energetic electrons with energies ranging from 20 eV to 120 eV, and these data are consistent with wavelength data. However, when an RF filter system, which filters out 13.56 MHz and 27.12 MHz harmonics, is used in the probe circuit, the energetic electron information disappears from probe traces. The hot electron information may be filtered out by the filter because the hot electrons observed by a Langmuir probe are time dependent (at the RF frequencies). To be certain that the data we detected are not due to RF perturbations, we need to eliminate the effects of RF perturbations without using a RF filter system. A method to do this is to graph the probe I-V characteristics by sampling the probe output RF signal at fixed times under different probe bias voltages. Energetic electrons with energies ranging from 20 eV to 30 eV have been detected by this time-sampled technique. Comparison between hot electron energies observed from time-average and time-sampled probe traces shows good agreement.
Keywords :
Langmuir probes; electron detection; microwave filters; plasma density; plasma diagnostics; plasma production; 20 to 30 eV; RF filter system; RF perturbations; RF plasma; energetic electron detection; helicon plasma source; hot electron energies; hot electron information; plasma density; probe I-V characteristics; probe bias voltages; probe circuit; time-sampled Langmuir probe; Circuits; Electrons; Information filtering; Information filters; Plasma density; Power harmonic filters; Probes; Radio frequency; Sampling methods; Voltage;
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
Print_ISBN :
0-7803-2669-5
DOI :
10.1109/PLASMA.1995.531578