DocumentCode :
227129
Title :
The glass-silicon-glass sandwich structured microplasma chip as the electron source of a micro mass spectrometer
Author :
Jiali Tang ; Xinhai Yu ; Youxing Chen ; Shan-Tung Tu ; Zhengdong Wang
Author_Institution :
Key Lab. of Pressure Syst. & Safety, East China Univ. of Sci. & Technol., Shanghai, China
fYear :
2014
fDate :
25-29 May 2014
Firstpage :
1
Lastpage :
1
Abstract :
Micro mass spectrometer is one of the most powerful porta-ble analytical instruments. And the micro electron impact (EI) ionization source, which has crucial effects on micro mass spectrometer´s performance, has been a research focus. In this study, a microplasma source as the electron source of the EI ionization source was developed to solve the difficulty in miniaturization on filament structure for conventional elec-tron source. The microplasma source was fabricated as a three wafer glass-silicon-glass sandwich with all the struc-tures realized in a highly doped silicon wafer via a deep reac-tive ion etch (DRIE) process. The microplasma source is 33 mm wide, 44 mm long, and 1.3 mm high.
Keywords :
electron impact ionisation; electron sources; mass spectrometers; plasma sources; sputter etching; EI ionization source; deep reactive ion etch process; electron source; filament structure; glass-silicon-glass sandwich structured microplasma chip; microelectron impact ionization source; micromass spectrometer; micromass spectrometer performance; microplasma source; miniaturization; Educational institutions; Electron optics; Electron sources; Ionization; Laboratories; Plasma temperature; Safety;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2711-1
Type :
conf
DOI :
10.1109/PLASMA.2014.7012205
Filename :
7012205
Link To Document :
بازگشت