DocumentCode
2271439
Title
Modelling of electron kinetics in low-pressure inductively coupled plasmas
Author
Kolobov, V.I. ; Parker, G.J. ; Hitchon, W.N.G.
Author_Institution
Eng. Res. Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA
fYear
1995
fDate
5-8 June 1995
Firstpage
150
Abstract
Summary form only given. Results are compared of two different methods of kinetic treatment of electrons in argon low-pressure Inductively-Coupled Plasma (ICP) sustained by an RF electric field from a planar coil. One approach involves a numerical "propagator" treatment of electron motion in five-dimensional phase space (two spatial and three velocity coordinates) using the so-called Convected Scheme. Another approach assumes small anisotropy of the electron distribution function (EDF) and employs the two term approximation in the Boltzmann equation. Both calculations are performed for given distributions of RF and static fields and incorporate the principal physical effects of ICP: electron heating by the inductive electric field and the influence of the static ambipolar field on electron kinetics under "non-local" conditions when the electrons perform many bounces in the potential well or change the direction of their motion in elastic collisions many times before suffering a substantial energy loss in collisions. Collision processes include elastic and inelastic electron-neutral collisions and electron-electron interactions.
Keywords
Boltzmann equation; argon; energy loss of particles; plasma collision processes; plasma kinetic theory; plasma radiofrequency heating; plasma transport processes; Ar; Boltzmann equation; RF electric field; convected scheme; elastic collisions; elastic electron-neutral collisions; electron distribution function; electron heating; electron kinetics; electron motion; electron-electron interactions; energy loss; five-dimensional phase space; inductive electric field; inelastic electron-neutral collision; low-pressure inductively coupled plasmas; nonlocal conditions; numerical propagator treatment; physical effects; planar coil; potential well; spatial coordinates; static ambipolar field; two term approximation; velocity coordinates; Anisotropic magnetoresistance; Argon; Boltzmann equation; Coils; Distribution functions; Electrons; Kinetic theory; Plasmas; Radio frequency; Resistance heating;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.531593
Filename
531593
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