DocumentCode
227164
Title
Electron emission from micro-architectured materials for plasma applications
Author
Raitses, Y. ; Jin, C.
Author_Institution
Princeton Plasma Phys. Lab., Princeton, NJ, USA
fYear
2014
fDate
25-29 May 2014
Firstpage
1
Lastpage
1
Abstract
Micro-engineered materials are predicted to have a small secondary electron emission (SEE) because their micro cavities should trap emitted electrons. Low SEE properties of these materials can be useful for various plasma applications including, Hall thrusters. It was previously demonstrated that the use of, for example, carbon velvet as the channel wall material for a Hall thruster can lead to dramatic improvements of insulating properties of magnetized thruster plasma allowing to reach significant dc electric fields of ~ 1kV/cm. Very recent measurements of SEE yield from a carbon velvet demonstrated a significantly smaller SEE yield from this engineered material as compared to graphite and much smaller than boron nitride ceramics. These results were obtained using a new experimental setup for SEE measurements at PPPL.
Keywords
boron compounds; electric fields; electron emission; electron traps; microcavities; plasma applications; Hall thruster; ceramics; channel wall material; electric fields; electrons; micro-architectured materials; micro-engineered materials; microcavities; plasma; plasma applications; secondary electron emission; Electron emission; Magnetic field measurement; Materials; Physics; Plasma applications; Plasma properties;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location
Washington, DC
Print_ISBN
978-1-4799-2711-1
Type
conf
DOI
10.1109/PLASMA.2014.7012224
Filename
7012224
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