• DocumentCode
    227164
  • Title

    Electron emission from micro-architectured materials for plasma applications

  • Author

    Raitses, Y. ; Jin, C.

  • Author_Institution
    Princeton Plasma Phys. Lab., Princeton, NJ, USA
  • fYear
    2014
  • fDate
    25-29 May 2014
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Micro-engineered materials are predicted to have a small secondary electron emission (SEE) because their micro cavities should trap emitted electrons. Low SEE properties of these materials can be useful for various plasma applications including, Hall thrusters. It was previously demonstrated that the use of, for example, carbon velvet as the channel wall material for a Hall thruster can lead to dramatic improvements of insulating properties of magnetized thruster plasma allowing to reach significant dc electric fields of ~ 1kV/cm. Very recent measurements of SEE yield from a carbon velvet demonstrated a significantly smaller SEE yield from this engineered material as compared to graphite and much smaller than boron nitride ceramics. These results were obtained using a new experimental setup for SEE measurements at PPPL.
  • Keywords
    boron compounds; electric fields; electron emission; electron traps; microcavities; plasma applications; Hall thruster; ceramics; channel wall material; electric fields; electrons; micro-architectured materials; micro-engineered materials; microcavities; plasma; plasma applications; secondary electron emission; Electron emission; Magnetic field measurement; Materials; Physics; Plasma applications; Plasma properties;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4799-2711-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.2014.7012224
  • Filename
    7012224