Title :
Liquid droplet-target laser plasma sources for EUV lithography
Author :
Keyser, C. ; Koay, C.-S. ; Bernath, R. ; Richardson, M. ; Turcu, E. ; Rieger, H. ; Powers, M.
Author_Institution :
Sch. of Opt., Central Florida Univ., Orlando, FL, USA
Abstract :
Summary form only given. Recently we have reported a new target configuration having >2% conversion efficiency making >60 W possible with diode pumped Nd:laser technology. We are currently undertaking a combined theoretical and experimental investigation of laser plasmas produced in this regime. This includes measurements of the plasma and radiation dynamics with particle, radiation and optical diagnostics. Laser-plasma sources must also meet stringent long-term operation and debris-free conditions for EUV lithography. We are making detailed studies of these issues.
Keywords :
X-ray lithography; drops; plasma applications; plasma diagnostics; plasma production by laser; solid lasers; ultraviolet lithography; 2 percent; 60 W; EUV lithography; conversion efficiency; debris-free conditions; diode pumped Nd:laser technology; liquid droplet-target laser plasma sources; long-term operation; optical diagnostics; radiation dynamics; target configuration; Diodes; Laser theory; Lithography; Optical pumping; Particle measurements; Plasma diagnostics; Plasma measurements; Plasma sources; Pump lasers; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
DOI :
10.1109/CLEO.2002.1034177
