Title :
A nonlinear optimization methodology for resistor matching in analog integrated circuits
Author :
Jiang, Sheng-Jhih ; Wu, Chan-Liang ; Ho, Tsung-Yi
Author_Institution :
Dept. of Comput. Sci. & Inf. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Abstract :
In analog design flow, one of the most important issues is to achieve accurate resistor ratios during the layout phase, which is called resistor matching. In the literature, researchers have proposed several methodologies achieving high matching quality in a rectangular structure. However, under the fixed-outline constraint, layout designers will place normal blocks such as macros and intellectual properties (IPs) first and then place the resistors. But the remaining space for resistors is usually rectilinear rather than rectangular, which is not appropriate for achieving high matching quality. To overcome this problem, we propose a nonlinear optimization methodology for globally improving the matching quality. Our algorithm enhances the matching quality by deforming the rectilinear shape into centro symmetrical shape and simultaneously maintains the relative positions of each block which is important for reserving the designed electrical property in the input layout. Experimental result shows that the proposed algorithm is very promising.
Keywords :
analogue integrated circuits; integrated circuit layout; nonlinear programming; resistors; analog design flow; analog integrated circuits; centrosymmetrical shape; fixed-outline constraint; layout designers; layout phase; matching quality; nonlinear optimization methodology; rectangular structure; rectilinear shape; resistor matching; resistor ratios; Dispersion; Layout; Niobium; Optimization; Resistors; Shape; Topology;
Conference_Titel :
VLSI Design, Automation, and Test (VLSI-DAT), 2012 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-2080-2
DOI :
10.1109/VLSI-DAT.2012.6212630