• DocumentCode
    2273042
  • Title

    Dry film photo resists and polymers - the low cost option for standard and 3-D wafer level packaging

  • Author

    Baumgartner, Tobias ; Hauck, Karin ; Töpper, Michael ; Manessis, Dion ; Ehrmann, Oswin ; Lang, Klaus-Dieter ; Liebsch, Werner ; Ehlin, Mats ; Itabashi, Toshiaki

  • Author_Institution
    Fraunhofer IZM, Berlin, Germany
  • fYear
    2010
  • fDate
    16-19 Aug. 2010
  • Firstpage
    50
  • Lastpage
    54
  • Abstract
    Driving packaging cost down is essential to make products cheaper. There are several options to reduce costs: One is to switch from one packaging technology to another (cheaper) one. The other is to cut costs for an existing process step by using cheaper material and/or a more cost effective process flow. For 3-D-packages dry films can be used as a photo mask for Si dry etching. They do have the capability to bridge over etched cavities or to create 3-D structure. Opportunities provided by the use of dry films will be discussed in the paper.
  • Keywords
    etching; masks; photoresists; polymers; wafer level packaging; 3D wafer level packaging; cost reduction; dry etching; dry film material; dry film photo resist; low cost option; packaging cost; photo mask; polymer; Films; Lamination; Metals; Plastics; Resists; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology & High Density Packaging (ICEPT-HDP), 2010 11th International Conference on
  • Conference_Location
    Xi´an
  • Print_ISBN
    978-1-4244-8140-8
  • Type

    conf

  • DOI
    10.1109/ICEPT.2010.5582369
  • Filename
    5582369