DocumentCode :
2273042
Title :
Dry film photo resists and polymers - the low cost option for standard and 3-D wafer level packaging
Author :
Baumgartner, Tobias ; Hauck, Karin ; Töpper, Michael ; Manessis, Dion ; Ehrmann, Oswin ; Lang, Klaus-Dieter ; Liebsch, Werner ; Ehlin, Mats ; Itabashi, Toshiaki
Author_Institution :
Fraunhofer IZM, Berlin, Germany
fYear :
2010
fDate :
16-19 Aug. 2010
Firstpage :
50
Lastpage :
54
Abstract :
Driving packaging cost down is essential to make products cheaper. There are several options to reduce costs: One is to switch from one packaging technology to another (cheaper) one. The other is to cut costs for an existing process step by using cheaper material and/or a more cost effective process flow. For 3-D-packages dry films can be used as a photo mask for Si dry etching. They do have the capability to bridge over etched cavities or to create 3-D structure. Opportunities provided by the use of dry films will be discussed in the paper.
Keywords :
etching; masks; photoresists; polymers; wafer level packaging; 3D wafer level packaging; cost reduction; dry etching; dry film material; dry film photo resist; low cost option; packaging cost; photo mask; polymer; Films; Lamination; Metals; Plastics; Resists; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology & High Density Packaging (ICEPT-HDP), 2010 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4244-8140-8
Type :
conf
DOI :
10.1109/ICEPT.2010.5582369
Filename :
5582369
Link To Document :
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