DocumentCode
2273308
Title
Determination of the relative concentration and the radial distribution of F radical atom concentration by plasma parameter normalization in ECR SF/sub 6//Ar discharge
Author
Yong-Jin Kim ; Pyung-Woo Lee ; Hong-Young Chang
Author_Institution
Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Taejon, South Korea
fYear
1995
fDate
5-8 June 1995
Firstpage
154
Lastpage
155
Abstract
Summary form only given, as follows. The relative concentration of the neutral radical atom can be determined by using optical emission actinometry (OEA). In OEA, a gas species called actinomer is added to compensate the effect of the plasma, that is, the excitation rate by electron impact. Therefore, if the concentration of the actinomer atoms can be assumed to be constant, the relative concentration of the radical atoms can be determined. But, for the nonuniform distribution of actinomer atom concentration which may appear in the fast pumping system (assumption of the constant radial profile of the actinomer concentration may not be proper). From this motivation, we have engaged an idea for the compensation of the plasma effect directly by using the plasma parameters which can be measured easily. We would call this as plasma parameter normalization method. Hutchinson derived a formula of k/sub c/ for the emission of atoms excited by the electrons of which energy distribution was Maxwellian. From this, we want to suggest a new method to determine relative concentration of the radical species, and the different change of the uniformities of the two neutral species, Ar, and F.
Keywords
argon; high-frequency discharges; plasma diagnostics; plasma properties; radiometry; sulphur compounds; ECR SF/sub 6//Ar discharge; F radial distribution; F radical atom concentration; F relative concentration; SF/sub 6/-Ar; electron energy distribution; electron impact excitation rate; fast pumping system; optical emission actinometry; plasma effect; plasma parameter normalization; Atom optics; Atomic measurements; Electrons; Magnetic field measurement; Nuclear and plasma sciences; Physics; Plasma diagnostics; Plasma measurements; Plasma temperature; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.531605
Filename
531605
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