• DocumentCode
    2273584
  • Title

    Total dose hardness of a commercial SiGe BiCMOS technology

  • Author

    Van Vonno, N. ; Lucas, Robert ; Thornberry, David

  • Author_Institution
    Intersil Corp., Melbourne, FL, USA
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    414
  • Lastpage
    417
  • Abstract
    Over the past decade SiGe HBT technology has progressed from the laboratory to practical commercial applications. When integrated into a CMOS process, this technology has potential applications in low-cost space systems. In this paper, we report results of total ionizing dose testing of a SiGe/CMOS process accessible through a commercial foundry
  • Keywords
    BiCMOS integrated circuits; Ge-Si alloys; integrated circuit technology; integrated circuit testing; radiation hardening (electronics); semiconductor materials; SiGe; SiGe BiCMOS technology; SiGe HBT/CMOS process; commercial BiCMOS technology; low-cost space systems; total dose hardness; total ionizing dose testing; BiCMOS integrated circuits; CMOS process; CMOS technology; Foundries; Germanium silicon alloys; Heterojunction bipolar transistors; Laboratories; Silicon germanium; Space technology; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radiation and Its Effects on Components and Systems, 1999. RADECS 99. 1999 Fifth European Conference on
  • Conference_Location
    Fontevraud
  • Print_ISBN
    0-7803-5726-4
  • Type

    conf

  • DOI
    10.1109/RADECS.1999.858617
  • Filename
    858617