• DocumentCode
    2273941
  • Title

    DLTS and capacitance transients study of defects induced by neutron irradiation in MOS structures CCD process

  • Author

    Ahaitouf, Az ; Losson, E. ; Charles, J.-P.

  • Author_Institution
    Centre Lorrain d´´Opt. et Electron. des Solides, Metz Univ., France
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    524
  • Lastpage
    527
  • Abstract
    The aim of this paper is to study neutron irradiation effects on PMOS capacitors and NMOSFETs. The characterization of induced defects was made by capacitance transients C(t) measurements, DLTS spectroscopy, and optical DLTS (ODLTS). DLTS spectra present three peaks (1, 2, and 3) due to deep levels created in the semiconductor and two peaks (4 and 5) due to minority carrier generation. Levels 1 and 2 are reported in the literature and it was suggested that the level 2 may be due to the divacancy. Two other minority carrier traps have been observed on ODLTS spectra after irradiation. This can explain the decrease of the minority carrier generation lifetime observed by capacitance transients measurements
  • Keywords
    MOS capacitors; MOSFET; carrier lifetime; deep level transient spectroscopy; minority carriers; neutron effects; vacancies (crystal); CCD process; DLTS spectroscopy; NMOSFETs; PMOS capacitors; capacitance transients; carrier generation lifetime; divacancy; minority carrier generation; neutron irradiation effects; optical DLTS; Capacitance measurement; Charge coupled devices; Electrical capacitance tomography; MOS capacitors; MOSFETs; Neutrons; Radiative recombination; Silicon; Spectroscopy; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radiation and Its Effects on Components and Systems, 1999. RADECS 99. 1999 Fifth European Conference on
  • Conference_Location
    Fontevraud
  • Print_ISBN
    0-7803-5726-4
  • Type

    conf

  • DOI
    10.1109/RADECS.1999.858636
  • Filename
    858636