• DocumentCode
    2274431
  • Title

    PhotoPDMS: Photodefinable PDMS for Rapid Prototyping

  • Author

    Jothimuthu, Preetha ; Bhagat, Ali Asgar S ; Papautsky, Ian

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Cincinnati, Cincinnati, OH
  • fYear
    2008
  • fDate
    13-16 July 2008
  • Firstpage
    183
  • Lastpage
    186
  • Abstract
    In this paper, we present a new and simple method of patterning polydimethylsiloxane (PDMS) directly under normal ambient light. This new photodefinable PDMS (photoPDMS) was applied to simplify otherwise complex microfabrication procedures such as fabrication of multi- layered microfluidic devices and patterning free-standing thin films for shadow masking on planar and non-planar surfaces. This new photoPDMS material offers numerous advantages including: direct patterning eliminating the need for a master template; ability to process under ambient light eliminating the need for sensitive lighting; and finally all advantages of PDMS including low cost and simple fabrication enabling rapid prototyping.
  • Keywords
    elastomers; lab-on-a-chip; microfluidics; optical polymers; rapid prototyping (industrial); ambient light; benzophenone photoinitiator; elastomer; lab-on-a-chip process; low cost fabrication; microfluidic devices; patterning; photodefinable polydimethylsiloxane; rapid prototyping; Biomedical optical imaging; Costs; Lab-on-a-chip; Lithography; Microfluidics; Optical device fabrication; Polymers; Prototypes; Resists; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
  • Conference_Location
    Louisville, KY
  • Print_ISBN
    978-1-4244-2484-9
  • Electronic_ISBN
    978-1-4244-2485-6
  • Type

    conf

  • DOI
    10.1109/UGIM.2008.54
  • Filename
    4573232