DocumentCode
2274431
Title
PhotoPDMS: Photodefinable PDMS for Rapid Prototyping
Author
Jothimuthu, Preetha ; Bhagat, Ali Asgar S ; Papautsky, Ian
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Cincinnati, Cincinnati, OH
fYear
2008
fDate
13-16 July 2008
Firstpage
183
Lastpage
186
Abstract
In this paper, we present a new and simple method of patterning polydimethylsiloxane (PDMS) directly under normal ambient light. This new photodefinable PDMS (photoPDMS) was applied to simplify otherwise complex microfabrication procedures such as fabrication of multi- layered microfluidic devices and patterning free-standing thin films for shadow masking on planar and non-planar surfaces. This new photoPDMS material offers numerous advantages including: direct patterning eliminating the need for a master template; ability to process under ambient light eliminating the need for sensitive lighting; and finally all advantages of PDMS including low cost and simple fabrication enabling rapid prototyping.
Keywords
elastomers; lab-on-a-chip; microfluidics; optical polymers; rapid prototyping (industrial); ambient light; benzophenone photoinitiator; elastomer; lab-on-a-chip process; low cost fabrication; microfluidic devices; patterning; photodefinable polydimethylsiloxane; rapid prototyping; Biomedical optical imaging; Costs; Lab-on-a-chip; Lithography; Microfluidics; Optical device fabrication; Polymers; Prototypes; Resists; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
Conference_Location
Louisville, KY
Print_ISBN
978-1-4244-2484-9
Electronic_ISBN
978-1-4244-2485-6
Type
conf
DOI
10.1109/UGIM.2008.54
Filename
4573232
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