• DocumentCode
    2274520
  • Title

    Electroluminescence from n-Mn doped ZnO/n-GaN heterojunction light-emitting diodes

  • Author

    Fu, Lerong

  • Author_Institution
    Dept. of Electromachine Eng., Jianghan Univ., Wuhan, China
  • fYear
    2012
  • fDate
    14-15 May 2012
  • Firstpage
    53
  • Lastpage
    56
  • Abstract
    A Mn doped ZnO (MZO) film was prepared on n-GaN coated sapphire substrate, followed by post-deposition annealing at 700 °C, thus an n-n heterojunction light-emitting diode (LED) was fabricated, and red electroluminescence (EL) at a low voltage was realized. The n-MZO/n-GaN heterojunction shows a rectification ratio of ~ 2.0 × 105 at ± 2 V and a dark current of 3.5 nA at -2 V. The n-MZO/n-GaN heterojunction LED displays a strong red electroluminescence with the threshold voltage of about 4.6 V. The dominant mechanism of EL is ascribed to the formation of the substitutional Mn in the interior of the MZO film annealed at a high temperature, and the formation of the MnZnGaO blocking layer during the annealing process is another potential factor.
  • Keywords
    III-V semiconductors; LED displays; annealing; electroluminescence; gallium compounds; manganese; rectification; sapphire; semiconductor doping; wide band gap semiconductors; zinc compounds; GaN-ZnO:Mn; MZO film; MnZnGaO; blocking layer; coated sapphire substrate; current 3.5 nA; heterojunction LED display; heterojunction light-emitting diode; post-deposition annealing process; rectification ratio; red electroluminescence; temperature 700 C; threshold voltage; voltage -2 V; Abstracts; Annealing; Impurities; Magnetic devices; Magnetic films; Manganese;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2012 12th International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4673-1258-5
  • Electronic_ISBN
    978-1-4673-1256-1
  • Type

    conf

  • DOI
    10.1109/IWJT.2012.6212809
  • Filename
    6212809