Title :
Electroluminescence from n-Mn doped ZnO/n-GaN heterojunction light-emitting diodes
Author_Institution :
Dept. of Electromachine Eng., Jianghan Univ., Wuhan, China
Abstract :
A Mn doped ZnO (MZO) film was prepared on n-GaN coated sapphire substrate, followed by post-deposition annealing at 700 °C, thus an n-n heterojunction light-emitting diode (LED) was fabricated, and red electroluminescence (EL) at a low voltage was realized. The n-MZO/n-GaN heterojunction shows a rectification ratio of ~ 2.0 × 105 at ± 2 V and a dark current of 3.5 nA at -2 V. The n-MZO/n-GaN heterojunction LED displays a strong red electroluminescence with the threshold voltage of about 4.6 V. The dominant mechanism of EL is ascribed to the formation of the substitutional Mn in the interior of the MZO film annealed at a high temperature, and the formation of the MnZnGaO blocking layer during the annealing process is another potential factor.
Keywords :
III-V semiconductors; LED displays; annealing; electroluminescence; gallium compounds; manganese; rectification; sapphire; semiconductor doping; wide band gap semiconductors; zinc compounds; GaN-ZnO:Mn; MZO film; MnZnGaO; blocking layer; coated sapphire substrate; current 3.5 nA; heterojunction LED display; heterojunction light-emitting diode; post-deposition annealing process; rectification ratio; red electroluminescence; temperature 700 C; threshold voltage; voltage -2 V; Abstracts; Annealing; Impurities; Magnetic devices; Magnetic films; Manganese;
Conference_Titel :
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4673-1258-5
Electronic_ISBN :
978-1-4673-1256-1
DOI :
10.1109/IWJT.2012.6212809