DocumentCode
2274520
Title
Electroluminescence from n-Mn doped ZnO/n-GaN heterojunction light-emitting diodes
Author
Fu, Lerong
Author_Institution
Dept. of Electromachine Eng., Jianghan Univ., Wuhan, China
fYear
2012
fDate
14-15 May 2012
Firstpage
53
Lastpage
56
Abstract
A Mn doped ZnO (MZO) film was prepared on n-GaN coated sapphire substrate, followed by post-deposition annealing at 700 °C, thus an n-n heterojunction light-emitting diode (LED) was fabricated, and red electroluminescence (EL) at a low voltage was realized. The n-MZO/n-GaN heterojunction shows a rectification ratio of ~ 2.0 × 105 at ± 2 V and a dark current of 3.5 nA at -2 V. The n-MZO/n-GaN heterojunction LED displays a strong red electroluminescence with the threshold voltage of about 4.6 V. The dominant mechanism of EL is ascribed to the formation of the substitutional Mn in the interior of the MZO film annealed at a high temperature, and the formation of the MnZnGaO blocking layer during the annealing process is another potential factor.
Keywords
III-V semiconductors; LED displays; annealing; electroluminescence; gallium compounds; manganese; rectification; sapphire; semiconductor doping; wide band gap semiconductors; zinc compounds; GaN-ZnO:Mn; MZO film; MnZnGaO; blocking layer; coated sapphire substrate; current 3.5 nA; heterojunction LED display; heterojunction light-emitting diode; post-deposition annealing process; rectification ratio; red electroluminescence; temperature 700 C; threshold voltage; voltage -2 V; Abstracts; Annealing; Impurities; Magnetic devices; Magnetic films; Manganese;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location
Shanghai
Print_ISBN
978-1-4673-1258-5
Electronic_ISBN
978-1-4673-1256-1
Type
conf
DOI
10.1109/IWJT.2012.6212809
Filename
6212809
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