Title :
Sub-Micron Integrated Grating Couplers for Single-Mode Planar Optical Waveguides
Author :
Hayes, Colin M. ; Pereira, Marcelo B. ; Brangers, Baylor C. ; Aslan, Mustafa M. ; Wiederkehr, Rodrigo S. ; Mendes, Sergio B. ; Lake, Joseph H.
Author_Institution :
Dept. of Phys. & Astron., Univ. of Louisville, Louisville, KY
Abstract :
The fabrication of integrated grating couplers for planar optical waveguides is presented. Holographic gratings with spatial period of 300-400 nm are produced in photoresist films using a Lloyd´s mirror setup. The periodic modulations of the gratings are transferred to soda-lime glass and fused silica substrates through deep reactive-ion etching with a depth of approximately 70 nm. A single-mode waveguide (in the visible region) is created by depositing a film of Al2O3 (180 nm) using an atomic layer deposition process. Characterization of several steps of the device fabrication was done by spectophotometry, atomic force microscope, and measurements of diffraction efficiency.
Keywords :
atomic layer deposition; holographic gratings; mirrors; optical couplers; optical fabrication; optical films; optical modulation; optical planar waveguides; photoresists; silicon compounds; sputter etching; Lloyds mirror setup; atomic force microscope; atomic layer deposition process; deep reactive-ion etching; diffraction efficiency measurement; fused silica substrates; holographic gratings; photoresist films; single-mode planar optical waveguides; soda-lime glass; spectophotometry; sub-micron integrated grating couplers; Couplers; Gratings; Holographic optical components; Holography; Integrated optics; Optical films; Optical modulation; Optical planar waveguides; Optical waveguides; Planar waveguides;
Conference_Titel :
University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
Conference_Location :
Louisville, KY
Print_ISBN :
978-1-4244-2484-9
Electronic_ISBN :
978-1-4244-2485-6
DOI :
10.1109/UGIM.2008.67