DocumentCode :
2274679
Title :
High-Temperature Microreactors for In-Situ Nanomaterial Deposition
Author :
Moiseeva, Evgeniya ; Harnett, Cindy
Author_Institution :
Electr. & Comput. Eng., Univ. of Louisville, Louisville, KY
fYear :
2008
fDate :
13-16 July 2008
Firstpage :
236
Lastpage :
238
Abstract :
We demonstrate the fabrication of sealed high- temperature microreactor for the integration of nanomaterials directly into microfluidic channels. In this approach, a microfluidic channel serves first as a microscopic chemical vapor deposition (CVD) system, then later as a fluid delivery system.
Keywords :
carbon nanotubes; chemical vapour deposition; microreactors; high-temperature microreactors; in-situ nanomaterial deposition; microfluidic channels; microscopic chemical vapor deposition; Biological materials; Biosensors; Carbon nanotubes; Chemical vapor deposition; Inductors; Nanobioscience; Nanoscale devices; Optical materials; Semiconductivity; Semiconductor nanotubes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
Conference_Location :
Louisville, KY
Print_ISBN :
978-1-4244-2484-9
Electronic_ISBN :
978-1-4244-2485-6
Type :
conf
DOI :
10.1109/UGIM.2008.69
Filename :
4573247
Link To Document :
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