DocumentCode
2274679
Title
High-Temperature Microreactors for In-Situ Nanomaterial Deposition
Author
Moiseeva, Evgeniya ; Harnett, Cindy
Author_Institution
Electr. & Comput. Eng., Univ. of Louisville, Louisville, KY
fYear
2008
fDate
13-16 July 2008
Firstpage
236
Lastpage
238
Abstract
We demonstrate the fabrication of sealed high- temperature microreactor for the integration of nanomaterials directly into microfluidic channels. In this approach, a microfluidic channel serves first as a microscopic chemical vapor deposition (CVD) system, then later as a fluid delivery system.
Keywords
carbon nanotubes; chemical vapour deposition; microreactors; high-temperature microreactors; in-situ nanomaterial deposition; microfluidic channels; microscopic chemical vapor deposition; Biological materials; Biosensors; Carbon nanotubes; Chemical vapor deposition; Inductors; Nanobioscience; Nanoscale devices; Optical materials; Semiconductivity; Semiconductor nanotubes;
fLanguage
English
Publisher
ieee
Conference_Titel
University/Government/Industry Micro/Nano Symposium, 2008. UGIM 2008. 17th Biennial
Conference_Location
Louisville, KY
Print_ISBN
978-1-4244-2484-9
Electronic_ISBN
978-1-4244-2485-6
Type
conf
DOI
10.1109/UGIM.2008.69
Filename
4573247
Link To Document